CF and CDF Series - Firing Infrared Furnace

High Temperature Infrared Furnaces for Firing & Drying

The new Despatch CF and CDF Series infrared furnaces are ideal for process applications that require rapid ramp-up and cool-down rates as well as provide consistent quality—as required in photovoltaic cell production.

Very fast ramp rates optimize contact formation on silicon wafers with shallow emitters and silicon nitride coating. Rapid heating and cooling allows firing the contact through the silicon nitrate while rapid cooling prevents damage to the junction. The rapid heating and cooling requires faster belt speeds which enhances throughput as a secondary benefit.

All models feature the most advanced ergonomic designs available, to speed maintenance and minimize downtime. With the push of a button, the entire chamber lowers for easy accessibility—no disassembly or expensive service calls for cleaning and maintenance. All electronic components are situated at eye level for easy and safe access.

Like every Despatch product, our new infrared line of high temperature furnaces delivers maximum production up-time, high throughput and high yields.

Standard Features

• Rapid thermal ramping (>80°C/sec)
• Closed loop temperature controls
• Enhanced software recipe management
• Advanced graphical user interface
• Master production control interface
• Data logging
• Redundant over-temperature shutdown
• Minimized wafer shadowing design
• Safe, simple chamber accessibility
• Eye-level electronics for easy maintainability

Options

• Water-cooled heat exchanger